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IEC 62040-4:2013
Uninterruptible power systems (UPS) - Part 4: Environmental aspects - Requirements and reporting
现行 ICS 29 电气工程 2013 34 页 ¥2
IEC 62040-5-3:2016
Uninterruptible power systems (UPS) - Part 5-3: DC output UPS - Performance and test requirements
现行 ICS 29 电气工程 2016 133 页 ¥5
IEC 62041:2017
Transformers, power supplies, reactors and similar products - EMC requirements
现行 ICS 33 电信、音频和视频工程 2017 30 页 ¥2
IEC 62044-3:2023 RLV
Cores made of soft magnetic materials - Measuring methods - Part 3: Magnetic properties at high excitation level
现行 ICS 29 电气工程 2023 143 页 ¥5
IEC 62046:2018
Safety of machinery - Application of protective equipment to detect the presence of persons
现行 ICS 13 环保、保健和安全 2018 91 页 ¥5
IEC 62046:2026
Safety of machinery - Application of protective equipment to detect the presence of persons
现行 ICS 13 环保、保健和安全 2026 262 页 ¥5
IEC 62047-11:2013
Semiconductor devices - Micro-electromechanical devices - Part 11: Test method for coefficients of linear thermal expansion of free-standing materials for micro-electromechanical systems
现行 ICS 31 电子学 2013 38 页 ¥2
IEC 62047-12:2011
Semiconductor devices - Micro-electromechanical devices - Part 12: Bending fatigue testing method of thin film materials using resonant vibration of MEMS structures
现行 ICS 31 电子学 2011 59 页 ¥3
IEC 62047-13:2012
Semiconductor devices - Micro-electromechanical devices - Part 13: Bend - and shear - type test methods of measuring adhesive strength for MEMS structures
现行 ICS 31 电子学 2012 30 页 ¥2
IEC 62047-14:2012
Semiconductor devices - Micro-electromechanical devices - Part 14: Forming limit measuring method of metallic film materials
现行 ICS 31 电子学 2012 34 页 ¥2
IEC 62047-16:2015
Semiconductor devices - Micro-electromechanical devices - Part 16: Test methods for determining residual stresses of MEMS films - Wafer curvature and cantilever beam deflection methods
现行 ICS 31 电子学 2015 21 页 ¥2
IEC 62047-17:2015
Semiconductor devices - Micro-electromechanical devices - Part 17: Bulge test method for measuring mechanical properties of thin films
现行 ICS 31 电子学 2015 54 页 ¥3
IEC 62047-18:2013
Semiconductor devices - Micro-electromechanical devices - Part 18: Bend testing methods of thin film materials
现行 ICS 31 电子学 2013 26 页 ¥2
IEC 62047-19:2013
Semiconductor devices - Micro-electromechanical devices - Part 19: Electronic compasses
现行 ICS 31 电子学 2013 60 页 ¥3
IEC 62047-1:2016
Semiconductor devices - Micro-electromechanical devices - Part 1: Terms and definitions
现行 ICS 31 电子学 2016 66 页 ¥5
IEC 62047-20:2014
Semiconductor devices - Micro-electromechanical devices - Part 20: Gyroscopes
现行 ICS 31 电子学 2014 108 页 ¥5
IEC 62047-21:2014
Semiconductor devices - Micro-electromechanical devices - Part 21: Test method for Poisson's ratio of thin film MEMS materials
现行 ICS 31 电子学 2014 26 页 ¥2
IEC 62047-22:2014
Semiconductor devices - Micro-electromechanical devices - Part 22: Electromechanical tensile test method for conductive thin films on flexible substrates
现行 ICS 31 电子学 2014 20 页 ¥1
IEC 62047-25:2016
Semiconductor devices - Micro-electromechanical devices - Part 25: Silicon based MEMS fabrication technology - Measurement method of pull-press and shearing strength of micro bonding area
现行 ICS 31 电子学 2016 45 页 ¥3
IEC 62047-26:2016
Semiconductor devices - Micro-electromechanical devices - Part 26: Description and measurement methods for micro trench and needle structures
现行 ICS 31 电子学 2016 57 页 ¥3